| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection apparatus for inspecting an irregularity of a periodic pattern imaged by an imaging apparatus, and stably and accurately imaging and detecting the irregularity. SOLUTION: The inspection apparatus for inspecting the irregularity of the periodic pattern comprises: an imaging section 30 provided with a means for imaging an image; a XY stage 20 provided with a means for placing an inspected substrate 50, recognizing its position and driving it in the X and Y directions; an oblique transmissive illumination section 10 provided with an illumination driving section 12 having a collimating optical system 11 fixed at a front end, driving the collimating optical system relative to the inspected substrate placed on the XY stage at an tilt angle in the parallel direction and controlling a fixed illumination position of an illumination relative to the substrate; and a processing section 40 provided with a means for managing the imaging section, the XY stage and the transmissive illumination section and sequentially processing steps for inspecting the irregularity of the periodic pattern. A diffraction light is generated by the oblique transmissive illumination in the periodic pattern, and imaged. COPYRIGHT: (C)2006,JPO&NCIPI |
