PATTERN DRAWING APPARATUS, PATTERN INSPECTION APPARATUS, SUBSTRATE, PATTERN DRAWING METHOD, AND PATTERN INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To efficiently record image drawing information relating to pattern drawing on a substrate.

SOLUTION: In a pattern drawing apparatus 1, an information pattern representing the drawing information is generated by an information pattern generating unit 511, and an expanded drawing pattern is generated by a drawing data generating unit 512 where the information pattern is added to a wiring pattern. An irradiation position on a substrate 9 is moved to scan with a light beam from a light beam exiting unit 411 by a stage moving mechanism 31 and a head unit moving mechanism 32 so as to draw the expanded drawing pattern including the information pattern on a resist for forming a wiring pattern on the substrate 9. The pattern drawing apparatus 1 is capable of efficiently recording the drawing information on the substrate 9 without using other recording devices or the like.

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