| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample fixing fixture enabling the irradiation of an ion beam at an irradiation angle larger than the upper limit of an irradiation angle peculiar to an ion milling device. SOLUTION: This sample fixing fixture is used in the ion milling device capable of irradiating the ion beam to a reference plane at a prescribed irradiation angle, and composed of a sample holding member to hold the sample to which the ion beam is irradiated, a pedestal fixed to a sample holding stand in the ion milling device, and a support member to support the sample holding member on the pedestal by connecting the sample holding member with the pedestal. The sample holding member is mounted to the pedestal by the support member in an inclined state with respect to the reference plane. COPYRIGHT: (C)2006,JPO&NCIPI
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