| 发明名称 |
Methods for inspection sample preparation |
| 摘要 |
Methods are provided for delineating different layers and interfaces for inspection of a semiconductor wafer, wherein a sectioned portion of a wafer is subjected to a reactive ion etch process before inspection using a scanning electron microscope.
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| 申请公布号 |
US7112288(B2) |
申请公布日期 |
2006.09.26 |
| 申请号 |
US20020218046 |
申请日期 |
2002.08.13 |
| 申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
CLARK FRED Y.;VANCE ANDREW L.;FARBER DAVID G. |
| 分类号 |
G01R31/00;H01L21/66 |
主分类号 |
G01R31/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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