发明名称 POSITION CONTROL STAGE APPARATUS AND SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a position control stage apparatus capable of accurately maintaining the flatness and levelness of a stage and performing cost-reduction, and a substrate treatment apparatus. SOLUTION: A cast iron is used for the stage 13, a movement table 30 placed with a pattern to be formed body P is provided on an upper surface 13a and the stage 13 is supported by six pneumatic actuators 12A-12F for lifting/driving it in a vertical direction. Further, an attitude controller 121 independently controls/drives the respective pneumatic actuators 12A-12F based on an output of a position sensor S1 such that the upper surface 13a of the stage 13 maintains a predetermined position. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006247474(A) 申请公布日期 2006.09.21
申请号 JP20050064473 申请日期 2005.03.08
申请人 DAINIPPON PRINTING CO LTD 发明人 MURATA MASAYUKI
分类号 B05C13/02;B05C11/00 主分类号 B05C13/02
代理机构 代理人
主权项
地址