发明名称 |
Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound |
摘要 |
A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is highly stable during storage and can give a resist pattern excellent in sectional rectangular shape and having high transparency to an exposure light, particularly a light having a wavelength of 300 nm or less.
|
申请公布号 |
US2006210913(A1) |
申请公布日期 |
2006.09.21 |
申请号 |
US20050553315 |
申请日期 |
2005.10.17 |
申请人 |
OGATA TOSHIYUKI;ENDO KOTARO;TSUJI HIROMITSU;YOSHIDA MASAAKI;SATO MITSURU;MATSUMARU SYOGO;HADA HIDEO |
发明人 |
OGATA TOSHIYUKI;ENDO KOTARO;TSUJI HIROMITSU;YOSHIDA MASAAKI;SATO MITSURU;MATSUMARU SYOGO;HADA HIDEO |
分类号 |
G03C1/76;C07C43/12;C07C43/162;C07C43/174;C07C69/96;C08F8/00;G03F7/004;G03F7/039;G03F7/075;H01L21/027 |
主分类号 |
G03C1/76 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|