| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing apparatus greatly high in washing performance. SOLUTION: The substrate washing apparatus has a plate substrate, cylindrical ices, a compressing means wherein the cylindrical ices are compressed on the whole surface of both the sides of the substrate under a constant pressure for the plate substrate and the three axes of rotary axes of two cylindrical ices and the central axis of the substrate are maintained so as to coincide, and a rotating means for making the cylindrical ices rotate in the opposite direction each other. COPYRIGHT: (C)2006,JPO&NCIPI
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