| 摘要 |
PROBLEM TO BE SOLVED: To provide a trench formation method by which a trench of which inclination angles of its right and left side walls are different from each other can be formed, a method for forming the pattern of a filler of which inclination angles of its two side walls are different from each other, a pattern of the filler, and a device using them. SOLUTION: The trench formation method is used to etch a part of a film 10 to be etched that is formed on a substrate 1 and to form a trench. The method includes a step to form a dry etching mask 30 on the film 10 that is provided with an opening 35 corresponding to the trench, and a step to etch the film 10 using the dry etching mask 30 as a mask so as to form a trench. The inclination anglesθDL andθDR of two side walls 35L and 35R facing each other with the opening 35 in-between are different from each other in the dry etching mask 30. COPYRIGHT: (C)2006,JPO&NCIPI |
