| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment device capable of effectively utilizing heat generated by an exposure means when alignment exposure is carried out. <P>SOLUTION: The alignment device is equipped with an alignment detecting means 11 for detecting an alignment mark, a mask fixing means 12 for fixing a mask 13 where a pattern for exposure is formed, a wafer fixing means 14 for fixing a wafer 15, a stage moving means 17 of moving a stage on which the wafer fixing means is mounted in respective directions X, Y, Z, and θ, and the exposure means 20a for exposing the wafer 15 to the pattern of the mask 13. Further, the device is equipped with a heat pipe 31 moving heat from the exposure means 20a, a thermoelectric converting means 33, and an accumulating means 44 of accumulating electricity generated by conversion. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
