发明名称 EPITAXIAL WAFER FOR LIGHT EMITTING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide the structure of a compound semiconductor crystal for light emitting devices which can reduce a memory effect without carrying out a dummy growth and can raise device property as the result. SOLUTION: Group III and group V material gases, doping materials and carrier gas are supplied on a heated substrate, and a vapor phase epitaxy of the compound semiconductor crystal is performed on the substrate. Consequently, in a compound semiconductor crystal for the semiconductor light emitting devices which performs the sequential lamination of at least n-type cladding layer 3, an activity layer 4, a p-type cladding layer 5 and a p-type cap layer 6 doped with Zn on an n-type substrate 1, it considers as a structure which carried out at least the one-layer lamination of the Zn memory effect reduction layer which consists of a compound semiconductor crystal further on the above p-type cap layer 6. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006253220(A) 申请公布日期 2006.09.21
申请号 JP20050064359 申请日期 2005.03.08
申请人 HITACHI CABLE LTD 发明人 TAKEUCHI TAKASHI
分类号 H01S5/343 主分类号 H01S5/343
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