发明名称 |
METHOD FOR MANUFACTURING ANTIREFLECTION FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film having high thickness uniformity without surface defect due to air bubble. <P>SOLUTION: In the method for manufacturing the antireflection film, a coating liquid 14 having viscosity of ≤0.01 Pa s is applied on a continuously traveling support W using a slot die 12. A pocket 18 supplying the coating liquid into the slot die and a slot 20 communicating with the pocket and for discharging the coating liquid outside the slot die are provided. A part of the coating liquid supplied to the inlet of the pocket is drawn out from the outlet of the pocket. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006251365(A) |
申请公布日期 |
2006.09.21 |
申请号 |
JP20050067826 |
申请日期 |
2005.03.10 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
IWASE EIJIRO;HASEGAWA YOICHI;OGAWA TOMONARI;NOUJIYOU KAZUHIKO |
分类号 |
G02B1/11;B05D1/26;B05D7/04 |
主分类号 |
G02B1/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|