发明名称 METHOD FOR MANUFACTURING ANTIREFLECTION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film having high thickness uniformity without surface defect due to air bubble. <P>SOLUTION: In the method for manufacturing the antireflection film, a coating liquid 14 having viscosity of &le;0.01 Pa s is applied on a continuously traveling support W using a slot die 12. A pocket 18 supplying the coating liquid into the slot die and a slot 20 communicating with the pocket and for discharging the coating liquid outside the slot die are provided. A part of the coating liquid supplied to the inlet of the pocket is drawn out from the outlet of the pocket. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006251365(A) 申请公布日期 2006.09.21
申请号 JP20050067826 申请日期 2005.03.10
申请人 FUJI PHOTO FILM CO LTD 发明人 IWASE EIJIRO;HASEGAWA YOICHI;OGAWA TOMONARI;NOUJIYOU KAZUHIKO
分类号 G02B1/11;B05D1/26;B05D7/04 主分类号 G02B1/11
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