发明名称 COATING AND DEVELOPING SYSTEM
摘要 <p>A coating and developing system is constructed so as to enable the maintenance of an exposure system combined therewith at desired time. The coating and developing system carries a substrate delivered to a carrier handling block to a processing block to form a film on the substrate by a coating block included in the processing block, carries the substrate through an interface block to the exposure system, processes the substrate having the exposed film by a developing process by a developing block included in the processing block and returns the thus processed substrate to the carrier handling block. A direct carrying means is superposed on the coating block and the developing block to carry a substrate having a surface coated with a film from the carrier handling block directly to the interface block. A test substrate can be carried to the exposure system to inspect the condition of the exposure system even in a state where the coating block and the developing block are under maintenance work.</p>
申请公布号 KR20060098339(A) 申请公布日期 2006.09.18
申请号 KR20060022803 申请日期 2006.03.10
申请人 TOKYO ELECTRON LIMITED 发明人 NOBUAKI MATSUOKA;SHINICHI HAYASHI;YASUSHI HAYASHIDA
分类号 H01L21/68;H01L21/027 主分类号 H01L21/68
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