发明名称 PHOTOSENSITIVE PASTE AND CALCINED PATTERN FORMED BY USE OF THE SAME
摘要 <p>The invention provides a light-sensitive paste, which is used in process for preparing refine intermittent pattern for plasma display panel, dielectric body pattern, electrode pattern and black-matrix pattern, and can inhibit thickening and gelatinization; the invention also provides sintered pattern with said light-sensitive paste. The light-sensitive paste comprises: (A) inorganic particle except boracic acid, (B) resin containing carboxy group, (C) photopolymer monomer, (D) photopolymer initiating agent, (E) boracic acid with average particular size being 20 um or smaller,(F) hydrophobic dissolvent, and (G) polyatomic alcohol, which is optimal.</p>
申请公布号 KR20060096901(A) 申请公布日期 2006.09.13
申请号 KR20060019336 申请日期 2006.02.28
申请人 TAIYO INK MFG. CO., LTD. 发明人 ITOH HIDEYUKI
分类号 G03F7/004;C08F2/48;G03F7/00;G03F7/033;G03F7/038;H01J11/22;H01J11/24;H01J11/34;H01J11/36;H01J11/38;H01J11/44 主分类号 G03F7/004
代理机构 代理人
主权项
地址
您可能感兴趣的专利