| 摘要 |
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a plate to be exposed, and a pupil filter that includes a first area and a second area formed outside of the first area, the first area being formed as a circular area upon which a low order diffracted light that has passed the pattern of the mask is incident, the second area being formed as an annular area upon which a high order diffracted light that does not contain the low order diffracted light is incident and which inverts a phase of half of the high order diffracted light incident and cancels out the high order diffracted light.
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