OPTICAL CHARACTERISTIC MEASUREMENT METHOD AND INSTRUMENT, SUBSTRATE USED FOR THE MEASUREMENT METHOD, AND EXPOSURE METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To measure the optical characteristics of an optical system under test with high accuracy, by reducing the effects of manufacturing errors in marks for measurement.

SOLUTION: A first group of aberration measurement marks 1A to 1I and a second group of aberration measurement marks 2A to 2I, severally obtained by 180° turning about the first group of marks are formed on a reticle mark plate RFM. A first aberration of a projection optical system is found, based on the images of the measurement marks 1A to 1I obtained by the optical system. A second aberration of the optical system is found, based on images of the measurement marks 2A to 2I. The first and second aberrations are averaged for reducing the effect of depiction errors in the measurement marks 1A to 1I.

COPYRIGHT: (C)2006,JPO&NCIPI