发明名称 FUSE LINK
摘要 <p>Described herein is a fuse incorporating a covering layer disposed on a conductive layer, which is disposed on a polysilicon layer. The covering layer preferably comprises a relatively inert material, such as a nitride etchant barrier. The covering layer preferably has a region of relatively less-inert filler material. Upon programming of the fuse, the conductive layer, which can be a silicide, preferentially degrades in the region underlying the filler material of the covering layer. This preferential degradation results in a predictable "blowing" of the fuse in the fuse region underlying the filler material. Since the "blow" area is predictable, damage to adjacent structures can be minimized or eliminated.</p>
申请公布号 EP1285463(B1) 申请公布日期 2006.09.06
申请号 EP20010937502 申请日期 2001.05.18
申请人 INFINEON TECHNOLOGIES AG;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 KOTHANDARAMAN, CHANDRASEKHARAN;GRELLNER, FRANK;IYER, SUNDAR, UMAR
分类号 H01L21/82;H01L23/525 主分类号 H01L21/82
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