| 发明名称 |
Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element |
| 摘要 |
Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.
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| 申请公布号 |
US7102732(B2) |
申请公布日期 |
2006.09.05 |
| 申请号 |
US20030425369 |
申请日期 |
2003.04.28 |
| 申请人 |
AGERE SYSTEMS GUARDIAN CORP. |
发明人 |
DE JAGER PIETER WILLEM HERMAN;KRUIT PIETER;BLEEKER ARNO JAN;VAN DER MAST KAREL DIEDERICK |
| 分类号 |
G03B27/54;G03F7/20;G03B27/32;G03B27/42;G21K5/00;H01J37/141;H01J37/30;H01J37/305;H01J37/317;H01L21/027 |
主分类号 |
G03B27/54 |
| 代理机构 |
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