发明名称 INTEGRATED CIRCUIT ARRANGEMENT COMPRISING A FIELD EFFECT TRANSISTOR, ESPECIALLY A TUNNEL FIELD EFFECT TRANSISTOR
摘要 The invention relates to an integrated circuit arrangement comprising a field effect transistor, especially a tunnel field effect transistor. The invention also relates to tunnel field effect transistors that have a thicker gate dielectric (GDI) compared to other transistors (T2) on the same integrated circuit arrangement (10). Alternatively or additionally, said tunnel field effect transistors have gate regions on opposing sides of a channel formation region or a boundary surface between the connection regions (Dl, Sl) of the tunnel field effect transistors.
申请公布号 WO2006087044(A1) 申请公布日期 2006.08.24
申请号 WO2005EP56659 申请日期 2005.12.09
申请人 INFINEON TECHNOLOGIES AG;HOLZ, JUERGEN;KAKOSCHKE, RONALD;NIRSCHL, THOMAS;PACHA, CHRISTIAN;SCHULZ, THOMAS;SCHMITT-LANDSIEDEL, DORIS;SCHRUEFER, KLAUS 发明人 HOLZ, JUERGEN;KAKOSCHKE, RONALD;NIRSCHL, THOMAS;PACHA, CHRISTIAN;SCHULZ, THOMAS;SCHMITT-LANDSIEDEL, DORIS;SCHRUEFER, KLAUS
分类号 H01L21/8234;H01L21/8239 主分类号 H01L21/8234
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