发明名称 |
METHOD AND APPARATUS FOR CONTROLLING SPATIAL TEMPERATURE DISTRIBUTION |
摘要 |
<p>A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base is controlled in operation a temperature below the desired temperature of a workpiece. The thermal insulator is disposed over at least a portion of the temperature-controlled base. The flat support holds a workpiece and is disposed over the thermal insulator. A heater is embedded within the flat support and/or mounted to an underside of the flat support. The heater includes a plurality of heating elements that heat a plurality of corresponding heating zones. The power supplied and/or temperature of each heating element is controlled independently. The heater and flat support have a combined temperature rate change of at least 1°C per second.</p> |
申请公布号 |
WO2006068805(A9) |
申请公布日期 |
2006.08.24 |
申请号 |
WO2005US43801 |
申请日期 |
2005.12.01 |
申请人 |
LAM RESEARCH CORPORATION;BENJAMIN, NEIL;STEGER, ROBERT, J. |
发明人 |
BENJAMIN, NEIL;STEGER, ROBERT, J. |
分类号 |
C23F4/00;H01L21/683;H01L21/00;H01L21/02;H01L21/3065 |
主分类号 |
C23F4/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|