| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid for immersion exposure which has a refractive index larger than that of pure water, has a superior permeability and can prevent the elution and dissolution of a photoresist film or its upper layer film component (especially, a hydrophilic component), never corrodes a lens and can therefore suppress the defects at the time of forming a resist pattern, never causes defects arising from the bubbles inside the liquid when the liquid is used as a liquid for immersion, and can form a pattern having a superior resolution and depth of focus. <P>SOLUTION: This liquid is used for an immersion exposure apparatus and immersion exposure method wherein exposure is conducted via a liquid which fills a space between a lens of a projection optical system and a substrate. The liquid is in a state of liquid in the operating temperature of the immersion exposure apparatus, and can be obtained by refining a chain saturated hydrocarbon compound having 6-13 carbons and has a transmissivity of 90% or above with respect to the radiation having a wavelength of 193 nm at the optical path length of 1 mm. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
