| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device enabled to improve uniformity of plasma density distribution and plasma generation efficiency. <P>SOLUTION: In the plasma treatment device of a system changing etching gas into plasma by irradiating electromagnetic waves in nearly cylinder-shaped etching treatment chamber 1 from a disc-shaped antenna 5, the disc-shaped antenna 5 is provided with a plurality of slot lines, arranged in an irradiating direction of the disc-shaped antenna 5 so that an electric field generated in the etching treatment chamber 1 is formed mainly with a component in a peripheral direction of the treatment chamber 1 by the electromagnetic waves irradiated from the disc-shaped antenna 5. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
