| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an application liquid supply device where linearity of discharge pressure of application liquid is sufficient and maintenance is easy. <P>SOLUTION: A resist supply device 11 in one form of the application liquid supply device is provided with a tube 31 where hydraulic fluid filling space 34 is formed for filling hydraulic fluid 25 at an outer periphery of a flexible tube 33 with which resist liquid is filled; and a pump 32 which contracts the tube 33 by transmitting hydraulic fluid 25 to the hydraulic fluid filling space 34, and pushes out resist liquid with which an inner part is filled. The pump 32 is provided with a cylinder 36 which is arranged by making a longitudinal direction vertical so that an upper face is opened, and in which the inner part is filled with hydraulic fluid; a piston 37 inserted into the cylinder 36; and a piston driving mechanism 38 reciprocating the piston 37 in a lengthwise direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
