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发明名称
Verfahren zur Herstellung eines vergrabenen Streifens durch Diffusion mittels Gasphasendotierung
摘要
申请公布号
DE10246175(B4)
申请公布日期
2006.08.10
申请号
DE20021046175
申请日期
2002.10.02
申请人
PROMOS TECHNOLOGIES, INC.
发明人
CHUNG, CHAO-HIS;WANG, HSIAO-LEI;LIAO, HUNG-KWEI
分类号
H01L21/8242;H01L21/223;H01L21/74
主分类号
H01L21/8242
代理机构
代理人
主权项
地址
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