| 摘要 |
A support table holds a working fluid in an inner space thereof, and has four cylindrical heaters arranged to surround a cooling plate disposed centrally of the support table. In time of heating, vapor generated from each cylindrical heater spreads toward a central region and peripheral regions of the support table (as schematically shown in two-dot chain line arrows). The vapor can reach peripheral ends, without flows of the vapor colliding with one another, in a way to suppress generation of stagnation points. Since the support table can be heated uniformly, a substrate is heat-treated uniformly over the entire surface thereof. The support table is cooled efficiently by the cooling plate disposed centrally of the support table.
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