发明名称 Semiconductor device having transistor with vertical gate electrode and method of fabricating the same
摘要 A semiconductor device includes transistors with a vertical gate electrode. In a transistor structure, a semiconductor pattern has first and second sides facing in a transverse direction, and third and fourth sides facing in a longitudinal direction. Gate patterns are disposed adjacent to the first and second sides of the semiconductor pattern. Impurity patterns directly contact the third and fourth sides of the semiconductor pattern. A gate insulating pattern is interposed between the gate patterns and the semiconductor pattern.
申请公布号 US2006170031(A1) 申请公布日期 2006.08.03
申请号 US20060344560 申请日期 2006.01.31
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 KANG SANG-WOO;HAN JEONG-UK;KIM YONG-TAE;YOON SEUNG-BEOM
分类号 H01L29/788 主分类号 H01L29/788
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