发明名称 IMPRINT LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide a novel imprint method, in which a template is produced from a non-optically-transparent material, which thus enables use of various materials that exhibit properties more suitable for certain use, such as improvement in the wear resistance or decrease in sticking, during separating the template from an imprinted medium, and furthermore the template is produced from a material that is patterned more easily, since an optically-transparent material (for example, crystal) is not restricted in use. SOLUTION: The imprint method includes a step of irradiating a photocuring medium to be imprinted in a fluid condition on a substrate by irradiation for starting the curing of the medium; a step of forming imprint in the medium, by contacting the medium to the template after the irradiation step; a step of setting the medium to be in a substantially non-fluid conditions and substantially curing the medium, while the medium contacting the template; and a step of separating the template from the medium, while the medium is in the substantially non-fluid conditions. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006203194(A) 申请公布日期 2006.08.03
申请号 JP20060000979 申请日期 2006.01.06
申请人 ASML NETHERLANDS BV;KONINKL PHILIPS ELECTRONICS NV 发明人 VAN SANTEN HELMAR;KOLESNYCHENKO ALEKSEY Y;NEIJZEN JACOBUS HERMANUS MARIA;VERSTEGEN EMILE JOHANNES KAREL
分类号 H01L21/027;B82B3/00 主分类号 H01L21/027
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