发明名称 METHOD FOR FABRICATION OF LOW-POLARIZATION IMPLANTABLE STIMULATION ELECTRODE
摘要 <p>A method for fabricating an implantable medical electrode includes roughening the electrode substrate, applying an adhesion layer, and depositing a valve metal oxide coating over the adhesion layer under conditions optimized to minimize electrode impedance and post-pulse polarization. The electrode substrate may be a variety of electrode metals or alloys including titanium, platinum, platinum-iridium, or niobium. The adhesion layer may be formed of titanium or zirconium. The valve metal oxide coating is a ruthenium oxide coating sputtered onto the adhesion layer under controlled target power, sputtering pressure, and sputter gas ratio setting optimized to minimize electrode impedance and post-pulse polarization.</p>
申请公布号 CA2594480(A1) 申请公布日期 2006.08.03
申请号 CA20062594480 申请日期 2006.01.25
申请人 MEDTRONIC, INC. 发明人 BRABEC, SCOTT J.;ROSE, RANDY G.;COLES, JAMES A. JR.;NYGREN, LEA A.
分类号 A61N1/05 主分类号 A61N1/05
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