| 摘要 |
A metal diaphragm valve used for a semiconductor manufacturing device allowing a large amount of flow to pass therein in spite of a compact size by reducing a fluid resistance of a flow passage ranging from a valve chamber to an outflow passage through an inflow passage in a valve body, comprising the body (2) having the inflow passage (6), the valve chamber (8), and the outflow passage (7), a metal diaphragm (3), a drive means (4), and an annular groove (5), characterised in that the diameter (D) of the outflow passage (6) is made larger than the groove width (W) of the annular groove (5), and the effective sectional area of the crossing portion of the annular groove (5) with the outflow passage (6) is made larger than the cross-sectional area of the outflow passage (6). <IMAGE> |
