| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-curing composition giving a hardened body excellent in pattern accuracy even under relatively small exposure energy, a method for storing the same, a method for forming a cured film, and a pattern forming method, and to provide a pattern using method using the pattern as a resist mask, electronic components, and an optical waveguide. <P>SOLUTION: The radiation-curing composition comprises (a) siloxane resin, (b) a photo acid generator or a photo base generator, and (c) a solvent capable of dissolving the component (a) and containing an aprotic solvent, wherein the content ratio of water in the radiation-curing composition is ≤2 mass%. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
