| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner having a reflecting optical system in which an exposure field size is large, and which can perform tuning of an optical property easily. <P>SOLUTION: In the aligner, the pattern of a mask M is illuminated using lighting a light from a lighting optical system IL, and is projected on a photosensitive substrate (plate) P through a projection optical system photo luminescence PL equipped with a reflective member. The aligner includes the concave mirror of the reflective member having a first concave mirror 10 and a second concave mirror 11 which are partial reflective members. The first concave mirror 10 is driven by a driving device 13, the second concave mirror 11 is driven based on a control signal from a controller 20 with a driving device 14, and the optical property of the projection optical system of the exposure device is regulated. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
