Lithographic apparatus, analyser plate, subassembly, method of measuring a parameter of a projectionsystem and patterning means,申请号SG20050008042-传众专利搜索

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发明名称	Lithographic apparatus, analyser plate, subassembly, method of measuring a parameter of a projectionsystem and patterning means
摘要
申请公布号	SG123712(A1)	申请公布日期	2006.07.26
申请号	SG20050008042	申请日期	2005.12.13
申请人	ASML NETHERLANDS B.V.	发明人	SENGERS TIMOTHEUS FRANCISCUS;KERKHOF VAN DE MARCUS ADRIANUS
分类号		主分类号
代理机构		代理人
主权项
地址

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