发明名称 |
Method of fabricating patterned polymer film with nanometer scale |
摘要 |
A method of fabricating a patterned polymer film with nanometer scale includes filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a desired polymer film; allowing the embossed stamp placed on the polymer film to stand at temperatures higher than a glass transfer temperature of the polymer film for a predetermined time; and releasing the embossed stamp from the polymer film. Alternatively, the patterned polymer film is obtained by filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a coating layer of a polymer precursor formed on a substrate; curing the coating layer; and releasing the embossed stamp from the cured coating layer.
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申请公布号 |
US7081269(B2) |
申请公布日期 |
2006.07.25 |
申请号 |
US20040761277 |
申请日期 |
2004.01.22 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
YANG SEUNG-MAN;JANG SE GYU;CHOI DAE-GEUN |
分类号 |
B05D5/12;H01L21/027;B05D1/42;G03F7/00;H01L51/40 |
主分类号 |
B05D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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