发明名称 Method of fabricating patterned polymer film with nanometer scale
摘要 A method of fabricating a patterned polymer film with nanometer scale includes filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a desired polymer film; allowing the embossed stamp placed on the polymer film to stand at temperatures higher than a glass transfer temperature of the polymer film for a predetermined time; and releasing the embossed stamp from the polymer film. Alternatively, the patterned polymer film is obtained by filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a coating layer of a polymer precursor formed on a substrate; curing the coating layer; and releasing the embossed stamp from the cured coating layer.
申请公布号 US7081269(B2) 申请公布日期 2006.07.25
申请号 US20040761277 申请日期 2004.01.22
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 YANG SEUNG-MAN;JANG SE GYU;CHOI DAE-GEUN
分类号 B05D5/12;H01L21/027;B05D1/42;G03F7/00;H01L51/40 主分类号 B05D5/12
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