VAPOR DEPOSITION SOURCE AND EVAPORATING APPARATUS AND METHOD FOR DEPOSITION USING THE SAME,申请号KR20050004301-传众专利搜索

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发明名称	VAPOR DEPOSITION SOURCE AND EVAPORATING APPARATUS AND METHOD FOR DEPOSITION USING THE SAME
摘要
申请公布号	KR20060084042(A)	申请公布日期	2006.07.21
申请号	KR20050004301	申请日期	2005.01.17
申请人	SAMSUNG SDI CO., LTD.	发明人	LEE, KYU SUNG;KIM, HAN KI;KIM, MYOUNG SOO
分类号	C23C14/24	主分类号	C23C14/24
代理机构		代理人
主权项
地址

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