| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus for enabling stable plasma discharge without performing coordination operation by a coordinator frequently. SOLUTION: The substrate treatment apparatus comprises a treatment chamber for storing substrates; a gas supplying means for supplying treatment gas into the treatment chamber; a pair of electrodes that generate plasma by applying high-frequency voltages and perform plasma the excitation of treatment gas supplied from the gas supplying means by the generated plasma; the coordinator that is connected between one of the pair of electrodes and a high-frequency power supply and performs impedance matching between one of the pair of electrodes and the high-frequency power supply; and a capacitor for connecting one and the other of the pair of electrodes. COPYRIGHT: (C)2006,JPO&NCIPI
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