发明名称 |
Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung |
摘要 |
<p>Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved. <IMAGE></p> |
申请公布号 |
DE60114678(T2) |
申请公布日期 |
2006.07.20 |
申请号 |
DE2001614678T |
申请日期 |
2001.02.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MAIDA, SHIGERU;YAMADA, MOTOYUKI;OTSUKA, HISATOSHI;SHIROTA, KAZUO;MATSUO, KOJI |
分类号 |
C03C3/06;C03B19/14;C03C4/00 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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