发明名称 Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung
摘要 <p>Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved. <IMAGE></p>
申请公布号 DE60114678(T2) 申请公布日期 2006.07.20
申请号 DE2001614678T 申请日期 2001.02.23
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 MAIDA, SHIGERU;YAMADA, MOTOYUKI;OTSUKA, HISATOSHI;SHIROTA, KAZUO;MATSUO, KOJI
分类号 C03C3/06;C03B19/14;C03C4/00 主分类号 C03C3/06
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