发明名称 HETEROJUNCTION SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a hetero junction semiconductor device in which film thickness is very thin, and a structure including a base region having higher carrier concentration has been achieved with the two-dimensional carrier gas layer which is different from that of the related art. SOLUTION: The hetero junction semiconductor comprises an emitter of the first conductivity type, a base of the second conductivity type, and three regions 21, 33, 24 of a collector of the first conductivity type. This semiconductor device has a structure that a through-hole 22c formed within a very small region is bored uniformly in the entire part of the flat surface of the base region 33 of the second conductivity type, a region showing the characteristics like that of a quantum structure is formed by filling the through-hole 22c with semiconductor having small band gap, and the two-dimensional electron gas or two-dimensional hole gas is formed in the region 22 like the quantum structure. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006190870(A) 申请公布日期 2006.07.20
申请号 JP20050002280 申请日期 2005.01.07
申请人 HITACHI CABLE LTD 发明人 KAWAGUCHI KAZUHISA;FUJIKAWA KAZUNARI
分类号 H01L21/331;H01L29/06;H01L29/737 主分类号 H01L21/331
代理机构 代理人
主权项
地址