PROCESSING METHOD AND DEVICE FOR FORMING CONDUCTIVE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a processing method and a processing device enabling mass production and for stably obtaining conductive patterns with high conductivity.

SOLUTION: The processing method is for forming a conductive pattern on a substrate by applying development treatment and removal treatment of a silver halide emulsion layer while conveying a precursor after exposing the precursor having at least a physical development nuclear layer and the silver halide emulsion layer in that order on the substrate. At least during the development process, a face with the physical development nuclear layer and the silver halide emulsion layer is to be conveyed in a non-contact state.

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