| 摘要 |
Thiophene-containing photo acid generators having either of the following general formulas:wherein at least one of R<1>, R<2 >or R<3 >is thiophene or thiophene that is substituted with alkyl, alkoxy or cycloalkyl, and the remaining R<1>, R<2 >or R<3>, not containing a thiophene moiety, are independently selected from the group consisting of alkyl, cycloalkyl and aryl, or at least one of R<1>, R<2 >or R<3 >are joined together to form a cyclic moiety having from about 4 to about 8 ring carbon atoms; and Y is a counter ion, are disclosed as well as the use thereof as a component of a chemically amplified resist composition. In addition to the thiophene-containing photo acid generator, the inventive composition includes a chemically amplified base polymer, a solvent, an optional photosensitizer, an optional base, an optional dissolution modifying agent and an optional surfactant. |
