A method for forming fine pattern in semiconductor device,申请号KR20000051309-传众专利搜索

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发明名称	A method for forming fine pattern in semiconductor device
摘要
申请公布号	KR100599446(B1)	申请公布日期	2006.07.12
申请号	KR20000051309	申请日期	2000.08.31
申请人		发明人
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
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