发明名称 Cantilevered type Film Bulk Acoustic Resonator fabrication method and Resonator fabricated by the same
摘要 A bottom electrode (120) is formed directly on a sacrificial layer (160) and on exposed dielectric layer (110) on the substrate (100). A top electrode (140) is formed on the piezoelectric layer (120) on the bottom electrode. The sacrificial layer is removed after top electrode formation to form air gap (170). Another dielectric layer is formed on the top electrode. An independent claim is also included for film bulk acoustic resonator.
申请公布号 KR100599083(B1) 申请公布日期 2006.07.12
申请号 KR20030025481 申请日期 2003.04.22
申请人 发明人
分类号 H01L41/02;H01L41/09;H01L41/08;H01L41/18;H01L41/187;H01L41/22;H01L41/23;H01L41/253;H03H3/02;H03H3/04;H03H9/17 主分类号 H01L41/02
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