| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist stripping agent having excellent resist stripping property and inducing no corrosion in a wiring material containing copper and/or aluminum or alloys of these. SOLUTION: The resist stripping agent comprises N,N,N',N'-tetrakis(hydroxypropyl) ethylenediamine. Further, the agent may contain water and/or a water-soluble organic solvent. The water-soluble organic solvent includes, for example, sulfoxides, sulfones, lactones, amides, lactams, imidazolidinones, glycols, and glycolethers. The agent preferably contains N,N,N',N'-tetrakis(hydroxypropyl) ethylenediamine by 1 to 90 wt.%, water by 0 to 90 wt.%, and a water-soluble organic solvent by 0 to 90 wt.%. COPYRIGHT: (C)2006,JPO&NCIPI |
