SILICON CARBIDE SINGLE CRYSTAL, SILICON CARBIDE SINGLE CRYSTAL WAFER, AND PROCESS FOR PRODUCING THE SAME
摘要
<p>This invention provides a large-diameter SiC single crystal having high resistivity and possessing high quality, an SiC single crystal wafer and a process for producing the same. The silicon carbide single crystal contains uncompensated impurities at an atom density of not less than 1 × 10<SUP>15</SUP>/cm<SUP>3</SUP> and contains vanadium in a concentration below the uncompensated impurity concentration. The silicon carbide single crystal wafer is produced by processing and polishing the silicon carbide single crystal and has an electrical resistivity of not less than 5 × 10<SUP>3</SUP> Ocm at room temperature.</p>