| 摘要 |
PROBLEM TO BE SOLVED: To provide a microscope apparatus capable of remarkably reducing dust-sticking on a sample such as a semiconductor wafer using an immersion objective lens and the occurrence of watermarks on the sample by quickly drying liquid remaining on the sample after performing the visual inspection of the sample. SOLUTION: The microscope apparatus 1 for performing the visual inspection of the wafer W, is provided with a liquid drying apparatus 30 having a holding stage 31 for holding the wafer W and a driving part 32 for tilting the holding stage 31, and a wafer transporting apparatus 40 for transporting the wafer W between an inspection stage 21 and the holding stage 31, and after finishing the visual inspection, the wafer W where the liquid E is already sucked by a suction nozzle 22d is transported by a transporting arm 42 from the inspection stage 21 to the holding stage 31, thereafter, the holding stage 31 is tilted by the driving part 32 (arrow (1) in Fig.), and also, rotated by a rotating part 33 (arrow (2) in Fig.), and the liquid E remaining on the surface of the wafer W is shaken off, then, the wafer W is dried. COPYRIGHT: (C)2006,JPO&NCIPI
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