发明名称 METHOD OF FORMING FILM, LIQUID SUPPLY HEAD, AND LIQUID SUPPLY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a film capable of forming a film at a local area on an inner periphery of a via-hole provided on a substrate at low cost by utilizing a simple process or a facility, and to provide a liquid supply head having a liquid repellent film formed by the above method and a liquid supply device having the liquid supply head. SOLUTION: In this method of forming a film, the liquid repellent film 7 is continuously formed on a face 22 of a nozzle plate 2 on the side of an ink ejection opening 211 and a local area 212a of an inner periphery 212 of a nozzle hole 21. The liquid repellent film 7 is formed from a process of forming a film to be processed on the whole faces of the inner periphery 212 of the nozzle hole 21 and the nozzle plate 2, a process of attaching a sheet material for protecting the film to be processed to the face 22 of the nozzle plate 2 such that the part of the sheet material is inserted in the nozzle hole 21, a process of obtaining the liquid repellent film 7 by applying a plasma treatment and/or an ultraviolet irradiation treatment on the upper face 23 of the nozzle plate 2 to remove a part of the film exposed from the sheet material, and a process of peeling to remove the sheet material from the nozzle plate 2. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006168259(A) 申请公布日期 2006.06.29
申请号 JP20040366055 申请日期 2004.12.17
申请人 SEIKO EPSON CORP 发明人 NISHIJIMA TATSUMI
分类号 B41J2/135 主分类号 B41J2/135
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