| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple and highly-sure sample for electron microscope observation for observing the section at a specific spot of a semiconductor element or the like by a transmission electron microscope, and its manufacturing method. SOLUTION: Film thinning of an observation object domain of the observation sample 3 is performed in order to observe a crystal defect or the like existing irregularly inside the observation sample 3. The sample 3 is provided with recessed groove 5a on a middle part in order to form a plurality of slices 1, 2 in the observation object domain, and the sample 3 has the plurality of thinned slices 1, 2 formed by providing processed grooves 5b on both outsides of the observation object domain. As for the conventional sample for electron microscope observation, one slice 11 is formed relative to an observation sample such as Si. On the contrary, in this observation sample 3, the two slices 1, 2, namely, the first slice 1 and the second slice 2, are formed by the recessed groove 5a and the processed grooves 5b. COPYRIGHT: (C)2006,JPO&NCIPI
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