| 摘要 |
In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, d<SUB>l</SUB>, d<SUB>tc </SUB>and d<SUB>r</SUB>, and refractive indices, n<SUB>l</SUB>, n<SUB>tc </SUB>and n<SUB>r</SUB>, of the immersion fluid, topcoat and resist may meet the following criteria: <?in-line-formulae description="In-line Formulae" end="lead"?>n<SUB>l</SUB><=N<SUB>tc</SUB><=N<SUB>r </SUB><?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>d<SUB>l</SUB>>~5.lambda<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>d<SUB>tc</SUB><=~5lambda<?in-line-formulae description="In-line Formulae" end="tail"?>
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