发明名称 Silicon wafer production process and silicon wafer
摘要 This silicon wafer production process has a step of cutting a silicon wafer from a silicon single crystal ingot in a perfect region which includes a perfect region P free of agglomerates of interstitial-silicon-type point defects and agglomerates of vacancy-type point defects and/or a region R in which there is occurrence of ring-shaped oxidation induced stacking faults, and a step of performing rapid thermal annealing on the silicon wafer in a hydrogen atmosphere, an argon atmosphere or an atmosphere containing a mixed gas thereof.
申请公布号 US7067005(B2) 申请公布日期 2006.06.27
申请号 US20040912051 申请日期 2004.08.06
申请人 SUMITOMO MITSUBISHI SILICON CORPORATION 发明人 SHIBAYAMA TAKASHI;MURAKAMI YOSHIO;SHINGYOJI TAKAYUKI
分类号 C30B25/12;C30B25/14 主分类号 C30B25/12
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