发明名称 |
Silicon wafer production process and silicon wafer |
摘要 |
This silicon wafer production process has a step of cutting a silicon wafer from a silicon single crystal ingot in a perfect region which includes a perfect region P free of agglomerates of interstitial-silicon-type point defects and agglomerates of vacancy-type point defects and/or a region R in which there is occurrence of ring-shaped oxidation induced stacking faults, and a step of performing rapid thermal annealing on the silicon wafer in a hydrogen atmosphere, an argon atmosphere or an atmosphere containing a mixed gas thereof.
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申请公布号 |
US7067005(B2) |
申请公布日期 |
2006.06.27 |
申请号 |
US20040912051 |
申请日期 |
2004.08.06 |
申请人 |
SUMITOMO MITSUBISHI SILICON CORPORATION |
发明人 |
SHIBAYAMA TAKASHI;MURAKAMI YOSHIO;SHINGYOJI TAKAYUKI |
分类号 |
C30B25/12;C30B25/14 |
主分类号 |
C30B25/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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