发明名称 Phase-change RAM containing AIN thermal dissipation layer and TiN electrode
摘要 Provided is a phase-change RAM containing a substrate, a lower electrode, a phase-change material, an upper electrode and a thermal dissipation layer, wherein the thermal dissipation layer contains an aluminum-nitride thermal dissipation layer having a high heat conductivity, and the lower electrode contains a titanium-nitride electrode which generates a great amount of heat generated using a small amount of current and has a low heat conductivity, whereby heat generated between the phase-change material and the electrode is not transferred to the interior of a device but fast dissipated to the exterior thereof, so as to enable a high speed operation using low current and improve reliability of the device.
申请公布号 US2006133174(A1) 申请公布日期 2006.06.22
申请号 US20050270711 申请日期 2005.11.08
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM SEONG-IL;KIM YONG-TAE;KIM YOUNG-HWAN;KIM CHUN-KEUN;YOUM MIN-SOO
分类号 G11C7/00 主分类号 G11C7/00
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