首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
CMP POLISHING PAD HAVING GROOVES ARRANGED TO IMPROVE POLISHING MEDIUM UTILIZATION
摘要
申请公布号
KR20060067139(A)
申请公布日期
2006.06.19
申请号
KR20050114709
申请日期
2005.11.29
申请人
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
发明人
MULDOWNEY GREGORY P.
分类号
H01L21/304;B24D99/00
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Semiconductor chip
Detecting the starting and stopping of movement of a person on foot
Time information management system
Nonvolatile semiconductor memory device
Connecting a die in an integrated circuit module
Counter balance spring assembly
Diagnosing and performing interventional procedures on tissue in vivo
Tool or tool holder
End-feed variable cam timing oil supply and control module
Damascene local interconnect process
Methods and systems for treating ischemia
Radiation structure for heating element
Thermally efficient portable computer incorporating deploying CPU module
Cosmetic composition comprising an aqueous dispersion of film-forming polymer particles containing 1,2-pentanediol
Method of making planar image sensor color filter arrays
Bi-frequency cellular telephone antenna
Controller for operating a dual duct variable air volume terminal unit of an environmental control system
Curable silicone adhesive compositions
Process for recycling waste aluminum dross
Packet training with an adjustable optimum number of packets
