| 发明名称 |
Fluorine-free metallic complexes for gas-phase chemical metal deposition |
| 摘要 |
The invention concerns novel copper or silver complexes and their use for gas-phase chemical deposition of metal copper or silver almost free of impurities.
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| 申请公布号 |
US2006121709(A1) |
申请公布日期 |
2006.06.08 |
| 申请号 |
US20050529569 |
申请日期 |
2005.09.29 |
| 申请人 |
DOPPELT PASCAL |
发明人 |
DOPPELT PASCAL |
| 分类号 |
H01L21/20;C07F1/00;C07F1/08;C07F1/10;C07F7/08 |
主分类号 |
H01L21/20 |
| 代理机构 |
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| 地址 |
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